DEUTSCH DE | ENGLISH EN

Sample Preparation for tomography

  • Dual Beam System Jeol JIB-4501
    Acceleration voltage 1 to 30 kV
    Maximal probe current 60 nA
    Resolution 2.5 nm at 30 kV
    12 nm at 1 kV
    Electron source LaB₆
    Magnification 5x bis 300.000x
    Ion source Gallium liquid metal ion source
    Beam Shapes Rectangle, line, point and bitmap
    Maximal sample size ca. 30 x 50 x 4 mm³ (horizontal insertion)
    Attachments Gas injection system for carbon and tungsten deposition
  • Plasma Cleaner Gatan Solarus
  • Precision Ar-Ion Polishing System Gatan PIPS 692